The Benefits of Using Rotary Metal Sputtering Targets

Molybdenum Rotary Target Description

Stanford Advanced Materials (SAM) provides high-purity Molybdenum Rotary Targets for advanced thin-film deposition applications, including flat panel displays, solar cells, and optical coatings. These targets are manufactured with high-purity molybdenum, ensuring excellent electrical conductivity, thermal stability, and uniform film formation. 

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The rotary design significantly increases material utilization compared to planar targets, extending service life and reducing production costs. Molybdenum’s high melting point and superior thermal conductivity allow stable performance even in high-temperature and high-vacuum environments, making it ideal for demanding coating processes. 

SAM offers Molybdenum Rotary Targets in various sizes and specifications to meet the needs of different sputtering systems. With precise manufacturing and strict quality control, SAM ensures that its targets deliver consistent and reliable performance, supporting efficient and cost-effective thin-film deposition across multiple industries.

Molybdenum Rotary Target Specification

Properties

Density

≥10.15 g/cm3

Average Grain Size

≤100 um

Roughness

≤0.8 um

Flatness

≤0.30 mm

Bonding Rate

≥98%

Chemical Composition. %

Main Content,

%, min

Mo

99.95

99.97

Impurity Content

(mass fraction),

%, max

Al

0.

0.

Ca

0.

0.

Cr

0.

0.

Cu

0.

0.

Fe

0.

0.

K

-

0.

Mg

0.

0.

Na

-

0.

Ni

0.

0.

Si

0.

0.

W

0.

0.

S

0.

-

For more information, please visit Rotary Metal Sputtering Targets.

Cd

0.

-

C

0.

0.

O

0.

0.

N

0.

0.

*The above product information is based on theoretical data. For specific requirements and detailed inquiries, please contact us.

Size (mm)

Rotary

G6

φ135/167*

G8.5

φ135/167*

*Customized sizes are also available upon request. Feel free to contact us for details.

Molybdenum Rotary Target Applications

• Flat Panel Displays (TFT-LCD & OLED): Used in the production of thin-film transistors (TFTs) as an electrode layer, ensuring high conductivity and stability for display performance.
• Solar Cells (CIGS & Thin-Film Photovoltaics): Serves as a back-contact layer in copper indium gallium selenide (CIGS) solar cells, enhancing efficiency and durability.
• Optical Coatings: Applied in anti-reflective and conductive coatings for high-precision optical and electronic devices.
• Semiconductor & Microelectronics: Used in barrier and interconnect layers for semiconductor fabrication, providing high-temperature stability and reliability.
• Touch Panels: Molybdenum alloys, such as MoNb, are used in touch panel sensor electrodes for improved corrosion resistance and performance.

Molybdenum Rotary Target Packaging

Our products are packaged in customized cartons of various sizes based on the material dimensions. Small items are securely packed in PP boxes, while larger items are placed in custom wooden crates. We ensure strict adherence to packaging customization and the use of appropriate cushioning materials to provide optimal protection during transportation.

Packaging: Carton, Wooden Box, or Customized.

Manufacturing Process

1. Brief Manufacturing Process Flow

2. Testing Method

1. Chemical Composition Analysis - Verified using techniques such as GDMS or XRF to ensure compliance with purity requirements.
2. Mechanical Properties Testing - Includes tensile strength, yield strength, and elongation tests to assess material performance.
3. Dimensional Inspection - Measures thickness, width, and length to ensure adherence to specified tolerances.
4. Surface Quality Inspection - Checks for defects such as scratches, cracks, or inclusions through visual and ultrasonic examination.
5. Hardness Testing - Determines material hardness to confirm uniformity and mechanical reliability.

Molybdenum Rotary Target FAQs

Q1: What are the advantages of using rotary sputtering targets over planar targets?

A1: Rotary targets offer higher material utilization (up to 80% or more) and longer service life compared to planar targets, reducing material waste and overall production costs.

Q2: What industries commonly use molybdenum rotary targets?

A2: These targets are widely used in flat panel displays (TFT-LCD & OLED), solar cells (CIGS thin-film photovoltaics), optical coatings, semiconductor manufacturing, and touch panel technology.

Q3: Can the molybdenum rotary targets be customized?

A3: Yes, we offer customized sizes, thicknesses, and bonding options to fit different sputtering systems and customer specifications.

Performance Comparison Table with Competitive Products

Molybdenum Rotary Target vs. Molybdenum Planar Target

Related Information

1. Raw Materials-Molybdenum

Molybdenum (Mo) is a refractory metal with a high melting point, excellent thermal and electrical conductivity, and outstanding corrosion resistance. It is a silvery-gray metal known for its strength and stability under extreme conditions, making it essential in various industrial applications.

Key Properties:

Atomic Number: 42

Atomic Weight: 95.95

Density: 10.28 g/cm³

Melting Point: 2,617°C (4,723°F)

Boiling Point: 4,639°C (8,382°F)

Thermal Conductivity: 138 W/m·K

Applications of Molybdenum:

Electronics & Thin-Film Coatings: Used in sputtering targets for TFT-LCD displays, solar panels, and semiconductor components.

Aerospace & High-Temperature Environments: Applied in high-performance alloys for aircraft and rocket components due to its heat resistance.

Energy Industry: Essential for nuclear reactors, power generation, and high-temperature furnaces.

Steel & Metal Alloys: Improves strength, hardness, and corrosion resistance in stainless steels and superalloys.

Chemical Industry: Acts as a catalyst in petroleum refining and chemical processing.

Molybdenum’s unique combination of high-temperature stability, durability, and conductivity makes it an invaluable material across multiple industries, particularly in advanced manufacturing and technology applications.

The sputtering target materials commonly found on the market can be divided into planar targets and rotatory targets according to their shapes. Want to know what are their advantages and disadvantages? Keep on reading this post.

Planar Sputtering Target

Although rotary targets have developed in recent years, the mainstream shape of the sputtering target is still the planar type.

Advantages

As for the planar target, its main advantages include simple structure, strong versatility, and good uniformity and repeatability of the film layer.

Simple structure – One of the main advantages of the planar target is its simple structure. Common shapes of planar targets on the market are rectangular and circular, which can be easily produced by molds. In other words, planar target preparation requires fewer machines and technologies and is easier to prepare. This is why planar targets still dominate the sputtering target market.

Low price – Price is always an important competitive factor. As mentioned above, the manufacturing process of the planar sputter target is easier, so its price is much lower than the rotatory sputter target.

Strong versatility – Planar sputtering targets usually have strong versatility. Therefore, the transportation process is relatively simple and the target materials are not easily damaged during transportation.

Good uniformity and repeatability – Film layers sputtered by planar targets usually boast good uniformity and repeatability. Planar targets are still best suited for prototype work or elemental experimentation, especially when large amounts of material are not needed at once.

Disadvantages

The biggest disadvantage of the planar target is the low utilization rate (generally only about 20%).  In the sputtering process of the planar target,  a strip-shaped pit will be formed when the target of the glow region (the magnetic field distribution region) is consumed to a certain extent, making the target body thinner. And once the pit depth reaches a certain value, the target cannot be utilized anymore. The low utilization rate also reduces its price advantage to some extent.

Rotatory Sputtering Target

Advantages

More surface area -Rotatory targets usually have more surface area per given length compared to planar targets. Therefore, the magnetron power can be spread out over a larger area in a given amount of time, which helps keep the target running cooler, decreases nodule formation, and reduces the occurrence of arcing.

Compact structure – Rotary sputtering decreases nodule formation, and targets can have longer continuous runtimes.

High utilization rate – The main advantage of the rotatory target over the planar target is the higher target utilization (generally about 80%).

Disadvantages

However, the rotatory target also has some unavoidable disadvantages in that there are many glow rings on the entire target surface during sputtering, so it cannot form a continuous strip glow.

Conclusion

The performance of different target shapes is related to specific preparation items and products, but we can come to a conclusion that rotary targets are more cost-effective for high-volume processes, while planar targets are still best suited for prototype work or elemental experimentation, especially when large amounts of material are not needed at once.

Want more information on rotary sputter target? Feel free to contact us.